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Dry Semiconductor Vacuum Pumps

Inpower Dry semiconductor vacuum pumps are specialized pumps used in the semiconductor industry to create a clean and dry vacuum environment. These pumps are essential for processes such as chemical vapor deposition, physical vapor deposition, ion implantation, and etching.
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Product Introduction

Inpower Dry semiconductor vacuum pumps are specialized pumps used in the semiconductor industry to create a clean and dry vacuum environment. These pumps are essential for processes such as chemical vapor deposition, physical vapor deposition, ion implantation, and etching.

 

Technical parameters:

 

Model

GXR110

GXR180

GXR320

GXR400

SPEED(50Hz)

m³/h

110

180

320

400

Ultimate Vacuum(50Hz)

Pa

≤1

≤1

≤1

≤1

POWER(50Hz)

Kw

4.5

7.5

7.5

7.5

Forced internal circulation cooling

GXR is equipped with a forced internal circulation cooling device, with a maximum pump body temperature of<50 ° C and a maximum motor temperature of<35 ° C

Voltage and frequency

Adapt to global voltage and frequency

Inlet/Outlet interface

Customizable flange interface/KF interface

 

Water

Pressure(MPa)

0.2~0.4

Flow L/min

3~5

Tem (℃)

10~30

 

N2

Pressure(MPa)

0.05~0.1

Flow L/min

6~20

Noise

dB

≤68

≤68

≤70

≤70

Weight

Kg

280

360

360

420

Monitoring and Control

Control panel/vacuum digital display/temperature monitoring/current monitoring/fault alarm/other network services

 

Model

GXR180/800

GXR180/1300

GXR180/1800

GXR450/2600

SPEED(50Hz)

m³/h

800

1300

1800

2600

Ultimate Vacuum(50Hz)

Pa

≤0.1

≤0.1

≤0.1

≤0.1

POWER(50Hz)

Kw

7.5

7.5

9

15

Forced internal circulation cooling

GXR is equipped with a forced internal circulation cooling device, with a maximum pump body temperature of<50 ° C and a maximum motor temperature of<35 ° C

Voltage and frequency

Adapt to global voltage and frequency

Inlet/Outlet interface

Customizable flange interface/KF interface

 

Water

Pressure(MPa)

0.2~0.4

Flow L/min

0.1

Tem (℃)

3~5

 

N2

Pressure(MPa)

10~30

Flow L/min

0.05~0.1

Noise

Pressure(MPa)

6~20

Weight

dB

≤70

≤70

≤72

≤72

Monitoring and Control

Kg

600

720

800

1350

SPEED(50Hz)

Control panel/vacuum digital display/temperature monitoring/current monitoring/fault alarm/other network services

 

 

Characteristic:

 

Contamination-Free Operation:

Dry screw pumps do not require any lubrication or sealing fluids, eliminating the risk of contamination in the vacuum chamber. This is crucial for maintaining the purity of the semiconductor manufacturing environment.

 

High Pumping Speed:

Dry screw pumps are capable of achieving high pumping speeds, making them well-suited for applications where rapid evacuation of gases is required, such as in semiconductor processing.

 

Low Maintenance Requirements:

Compared to oil-sealed pumps, dry screw pumps have lower maintenance needs since they do not rely on oil for operation. This leads to reduced downtime and cost savings over the pump's lifecycle.

 

Energy Efficiency:

Dry screw pumps are designed for energy efficiency, helping semiconductor manufacturers reduce their overall energy consumption and operating costs.

 

Wide Operating Range:

These pumps can operate across a wide range of pressures, offering flexibility in various semiconductor manufacturing processes that require different vacuum levels.

 

Compact Design:

Dry screw pumps typically have a compact design, allowing for easy integration into semiconductor equipment and saving valuable floor space in cleanroom environments.

 

Reliability:

Dry screw pumps are known for their reliability and long service life, providing consistent performance over time and contributing to the overall efficiency of semiconductor manufacturing operations.

 

Inpower Dry semiconductor vacuum pumps Application area:

 

Semiconductor Manufacturing:

Dry screw pumps play a critical role in various semiconductor manufacturing processes, including chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, etching, and sputtering. They help create and maintain the required vacuum levels essential for these processes.

 

Thin Film Deposition:

In thin film deposition techniques such as sputtering and evaporation, dry screw pumps are utilized to evacuate the process chamber and maintain the required vacuum conditions for depositing thin films on substrates.

 

Wafer Processing:

Dry screw pumps are employed in wafer processing steps such as cleaning, patterning, and doping, where maintaining a clean and dry vacuum environment is crucial for achieving precise and reliable results.

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